Ion beam scanning control methods and systems for ion...

Radiant energy – Means to align or position an object relative to a source or...

Reexamination Certificate

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C250S492210

Reexamination Certificate

active

07078707

ABSTRACT:
Methods are provided for calibrating an ion beam scanner in an ion implantation system, comprising measuring a plurality of initial current density values at a plurality of locations along a scan direction, where the values individually correspond to one of a plurality of initial voltage scan intervals and one of a corresponding plurality of initial scan time values, creating a system of linear equations based on the measured initial current density values and the initial voltage scan intervals, and determining a set of scan time values that correspond to a solution to the system of linear equations that reduces current density profile deviations. A calibration system is provided for calibrating an ion beam scanner in an ion implantation system, comprising a dosimetry system and a control system.

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patent: 5198676 (1993-03-01), Benveniste et al.
patent: 5811823 (1998-09-01), Blake et al.
patent: 5998798 (1999-12-01), Halling et al.
patent: 6677598 (2004-01-01), Benveniste

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