Ion beam profile control apparatus and method

Details Ion beam profile control apparatus and method Ion beam profile control apparatus and method

1979-04-09

1981-07-14

Garrett, Robert E.

Power plants

Reaction motor

Ion motor

60204, 60230, 313239, 313352, 313360, F02K 900, F03H 500

Patent

active

042779391

ABSTRACT:
Ion chamber 20 receives electrons from cathode 28 and produces ions by electron bombardment in discharge plasma chamber 20. Ions are extracted through ion optics including screen 22 and accelerator electrode 24. Higher ion densities in the center of the discharge chamber are reduced by spoiler 42 which is operated at a potential between cathode and anode potential. This reduces double ionization and central peaking to provide a more uniform ion beam through the optics. By employing laterally positioned spoiler elements beam steering can be accomplished. The ion source is useful wherever a uniform beam profile is desirable as in ion implantation. Controlling the direction of beam density is useful in ion machining and in ion thrusters for space application.

REFERENCES:
patent: 3500122 (1970-03-01), Sohl
patent: 3603088 (1971-09-01), Nakanishi
patent: 3604209 (1971-09-01), King et al.
patent: 3620018 (1971-11-01), Banks
patent: 3728861 (1973-04-01), Pawlik et al.
patent: 4011719 (1977-03-01), Banks
patent: 4028579 (1977-06-01), King

Affiliated with

Also associated with

Rating

Ion beam profile control apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion beam profile control apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion beam profile control apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2159234