Ion beam processing system and ion beam processing method

Details Ion beam processing system and ion beam processing method Ion beam processing system and ion beam processing method

2007-10-30

2007-10-30

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298340, C156S345390

Reexamination Certificate

active

10928832

ABSTRACT:
An ion beam processing system emitting an ion beam at a workpiece to process the workpiece, provided with an electrode for applying an electric field to the workpiece, the potential of the electrode being made 0V or a negative potential, and a cover insulated from the electrode arranged at an ion beam incidence side of the electrode, thereby preventing or suppressing sputtered particles from redepositing on a master pattern and the processed surface to form burrs, and an ion beam processing method used with the same.

REFERENCES:
patent: 3534385 (1970-10-01), Bernheim et al.
patent: 4457803 (1984-07-01), Takigawa
patent: 06-293967 (1994-10-01), None
patent: 11-2890580 (1999-10-01), None
Hiroshi Gokan, et al., Fine Pattern Fabrication by Ion-beam Etching, Vacuum, vol. 20, No. 11, pp. 17-25, 1977.
Per G. Gloersen, Ion-beam etching, J. Vac. Sci. Techn. vol. 12, No. 1, pp. 28-35, 1975.

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