Ion beam milling to generate custom reticles

Details Ion beam milling to generate custom reticles Ion beam milling to generate custom reticles

1999-01-13

2000-10-10

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

20419233, G03F 900, G23C 1400

Patent

active

061300128

ABSTRACT:
Various methods of fabricating a reticle are provided. In one aspect, a pattern of opaque structures is formed on a plate capable of transmitting electromagnetic radiation. Adjacently positioned angled surfaces of the opaque structures are identified. Preselected portions of the opaque structures that encompass the adjacently positioned angled surfaces are then removed by ion-beam milling or other methods. Reticle patterns may be customized by modifying the structures of adjacent polygon structures that could otherwise give rise to diffraction-induced patterning errors on resist layers.

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patent: 5273850 (1993-12-01), Lee et al.
patent: 5635316 (1997-06-01), Dao
patent: 5876881 (1999-03-01), Kawata
patent: 6033811 (2000-03-01), Lee
patent: 6044007 (2000-03-01), Capodieci
Stanley Wolf and Richard N. Tauber; Silicon Processing for the VLSI Era, vol. 1--Process Technology; pp. 476-489; 1986.

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