Ion beam measurement systems and methods for ion implant...

Details Ion beam measurement systems and methods for ion implant... Ion beam measurement systems and methods for ion implant...

2006-01-31

2006-01-31

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S397000

Reexamination Certificate

active

06992309

ABSTRACT:
Dosimetry systems and methods are also presented for measuring a scanned ion beam at a plurality of points along a curvilinear path at a workpiece location in a process chamber. An illustrated dosimetry system comprises a sensor and a mounting apparatus that supports support the sensor and selectively positions the sensor at a plurality of points along the curvilinear path, wherein the mounting apparatus can selectively position the sensor to point toward a vertex of the scanned ion beam.

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“NV-6208: A Midcurrent Ion Implanter With Constant Beam Angle or Incidence”, Jimmy L. Fleming, Jerald P. Dykstra, Monty L. King, Andy M. Ray and Robert B. Simonton, Nuclear Instruments and Methods in Physics Research B 37/38 (1989), North Holland, Amsterdam, pp. 601-604.

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