Ion beam irradiation device and operating method thereof

Details Ion beam irradiation device and operating method thereof Ion beam irradiation device and operating method thereof

2005-11-22

2005-11-22

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S491100, C250S492100, C250S492200, C250S492300, C349S123000, C349S128000, C349S134000, C349S136000, C436S030000

Reexamination Certificate

active

06967340

ABSTRACT:
An ion beam irradiation device includes a vacuum chamber and a stage on which at least two substrates may be mounted such that each substrate has an inclination angle to a horizontal plane of the vacuum chamber. The stage moves in one direction. An ion gun provided in the vacuum chamber produces ion beams that irradiate the substrates. In a single pass through the vacuum chamber, the alignment layers disposed on multiple substrates may be aligned. The substrates can be aligned such that the ion beam irradiates multiple substrates simultaneously and/or such that the ion beam irradiates the multiple substrates sequentially.

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