Ion beam irradiation apparatus for suppressing charge up of...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S492300, C250S492100

Reexamination Certificate

active

07087912

ABSTRACT:
An ion beam irradiation apparatus is equipped with a plasma generator which generates a plasma and supplies it to a region in the vicinity of the upstream side of a substrate, thereby suppressing a charging up of a surface of the substrate, which results from an irradiation of the ion beam. The radio frequency electric source for supplying the plasma for generating the plasma to a plasma generator is a radio frequency electric source for producing a radio frequency electric power formed by amplitude modulating an original radio frequency signal.

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Office Action dated Jul. 19, 2005, in Co-Pending Korean Patent Application No. 2002-0076453.

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