Ion beam implantation-sputtering

Details Ion beam implantation-sputtering Ion beam implantation-sputtering

1977-06-06

1978-08-22

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, 118 491, C23C 1500

Patent

active

041087518

ABSTRACT:
Material is deposited onto and implanted into a substrate by directing a beam of ions against a target, comprised of the material to be deposited, so as to sputter neutral particles and ionized particles from the target towards the substrate. The ionized particles are accelerated to energies sufficient to penetrate the substrate and be implanted therein and provide a strong bond. Sputter cleaning of the substrate surface by particles of sufficient energy also takes place.

REFERENCES:
patent: 3472751 (1969-10-01), King
patent: 3732158 (1973-05-01), Przybyszewski et al.
patent: 4013830 (1977-03-01), Pinch et al.
N. Ohmae et al., "Prevention of Fretting by Ion Plated Film", Wear, vol. 30, pp. 299-309 (1974).
R. G. Wilson et al., "Ion Beams", Wiley & Sons, N.Y. (1973), pp. 317-322.
D. M. Mattox, "Fundamentals of Ion Plating", J. Vac. Sci. Tech; vol. 10, pp. 47-52 (1973).

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