Ion beam implantation method and apparatus for particulate contr

Details Ion beam implantation method and apparatus for particulate contr Ion beam implantation method and apparatus for particulate contr

1991-03-13

1992-07-28

Berman, Jack L.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37317

Patent

active

051342995

ABSTRACT:
An ion beam implanter having a remote ion beam collector to reduce particulate contamination in the region of the implant chamber. A resolving magnet is activated during implantation to bend ions that exit a source to a trajectory leading to an ion implantation chamber. By de-activating the resolving magnet when not implanting, ions from the source follow a linear path to the ion beam collector.

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patent: 4736107 (1988-04-01), Myron
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patent: 4804837 (1989-02-01), Farley
patent: 4812663 (1989-03-01), Douglas-Hamilton et al.
patent: 4883968 (1989-11-01), Hipple et al.
patent: 4914305 (1990-04-01), Benveniste et al.

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