Ion beam implantation display method and apparatus

Details Ion beam implantation display method and apparatus Ion beam implantation display method and apparatus

1986-09-24

1988-08-02

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250397, 250398, 324713, H01J 3730

Patent

active

047615591

ABSTRACT:
A display system for use in monitoring ion beam characteristics of an ion beam implantation system. The display includes a cathode ray tube having vertical and horizontal deflection controls. The vertical deflection control is modulated by an indication of ion beam current impinging upon a target wafer. The horizontal deflection control is modulated with a signal related to beam scanning by a deflection electrode. The resultant image provides a system operator with a visual indication of the ion beam.

REFERENCES:
patent: 4514637 (1985-04-01), Dykstra et al.
McKenna, Springer Series in Electrophysics, vol. 10: Ion Implantation Techniques, 1982, pp. 73-103.

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