Ion beam gun and ion beam exposure device

Details Ion beam gun and ion beam exposure device Ion beam gun and ion beam exposure device

1987-10-13

1990-02-20

Anderson, Bruce C.

Radiant energy

Ion generation

Field ionization type

2505051, H01J 2700

Patent

active

049028979

ABSTRACT:
An ion beam exposure device including an ion beam source and an ion beam mask is provided. The ion beam source is formed from a thin film which is disposed between a vacuum side and a gas side. The film is in the form of a plate having a fine wire buried therein or a crystal boundary formed therein. An electric field supplied to the plate ionizing the gas passing from the gas source side of the plate to the vacuum side. A patterned ion mask may be formed directly on the ion beam source, thereby creating an ion beam gun which emits an ion beam in the desired pattern.

REFERENCES:
patent: 3519873 (1970-07-01), O'Keeffe
patent: 3895234 (1975-07-01), O'Keeffe et al.
patent: 4227090 (1980-10-01), Amboss
patent: 4694222 (1987-09-01), Wakalopulos
patent: 4695732 (1987-09-01), Ward

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