Ion beam device

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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Reexamination Certificate

active

07435976

ABSTRACT:
An ion beam apparatus comprises an ion source2which extracts an ion beam4,a mass separation electromagnet6which separates an ion beam4of desired mass from the ion beam4extracted from the ion source2,a scanner12which scans the injected ion beam4with a given scan center as center within a given scan surface, an electrostatic deflector30which deflects the ion beam through 90° so that an ion beam of desired energy in said ion beam travels in a direction perpendicular to said scan surface within a circular-arc-shaped deflection zone centered on the scan center, and a scanning mechanism54which retains a target50and which mechanically, reciprocally moves the target54in a direction in which the target crosses the ion beam passed from the electrostatic deflector30at a given angle.

REFERENCES:
patent: 4962308 (1990-10-01), Bormans et al.
patent: 5099130 (1992-03-01), Aitken
patent: 5373164 (1994-12-01), Benveniste
patent: 3-233845 (1991-10-01), None
patent: 6-188215 (1994-07-01), None
patent: 6-196118 (1994-07-01), None
patent: 7-302568 (1995-11-01), None
patent: 2969788 (1999-08-01), None
patent: 11-354064 (1999-12-01), None
patent: 11-3545064 (1999-12-01), None
patent: 2002-175771 (2002-06-01), None
patent: 3358336 (2002-10-01), None

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