Ion beam deposition of diamond-like carbon films

Details Ion beam deposition of diamond-like carbon films Ion beam deposition of diamond-like carbon films

1995-04-12

1996-08-20

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

427561, 427577, 427249, 4272555, 264317, 423446, C23C 1448, B05D 306

Patent

active

055477143

ABSTRACT:
A process forms an amorphous carbon film over a solid, which film has physical and chemical properties similar to those of diamond. Its ancillary objects are the solid bodies so coated and the self-sustained film obtained in a subsequent stage of dissolution of said substrate. The process includes generating a highly accelerated beam of carbon-hydrogenated ions, which beam is made to impact with sufficiently high energy on the surface of the substrate. The beam is concentrated by electrostatic lenses and homogenized by a magnetic mass separator. The process forms on a solid substrate, a film with properties similar to those of diamond, such as high hardness, high chemical stability, transparency, high heat conductivity and high electric resistivity; obtainable at ambient temperature, and which is simpler than known procedures.

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"Structure and Annealing Properties of Silicon Carbide Thin Layers formed by Implantation of Carbon Ions in Silicon", Kimura et al, Thin Solid Films 81(1981) pp. 319-327.
"Comparison of diamondlike coatins deposited with C.sup.+ and Various Hydrocarbon ion beams", Antilla Koskinen et al. Applied Phys. Lett. 50 (3), 19 Jan. 1987, pp. 132-134.
A New Method for Making Long-Lived Carbon Foils . . . I. Sugai et al, Nuclear Instruments & Methods Vol A-236 (1985) pp. 576-589.

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