Ion beam deposition apparatus

Details Ion beam deposition apparatus Ion beam deposition apparatus

1985-01-30

1985-12-24

Hoffman, James R.

Coating apparatus

Gas or vapor deposition

With treating means

427 38, C23C 1308

Patent

active

045599017

ABSTRACT:
An ion beam deposition apparatus capable of uniformly distributing an ionized vaporized material on a desired area of a substrate is disclosed. The apparatus includes an accelerating electrode and a deflecting electrode each arranged between an ionization region and a substrate.

REFERENCES:
patent: 4451499 (1984-05-01), Morimoto et al.

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