Ion beam apparatus for finishing patterns

Details Ion beam apparatus for finishing patterns Ion beam apparatus for finishing patterns

1987-08-14

1989-04-11

Albritton, C. L.

Electric heating

Metal heating

By arc

21912115, 21912119, B23K 1500

Patent

active

048208981

ABSTRACT:
An apparatus for finishing patterns, for example, masks for chip manufacture is provided with an ion source the ion beam current strength of which can be adjusted at a comparatively low value for removing material therewith, for restoring opaque defects, and at a comparatively high current value for the deposition of material from the ion beam as such, for restoring clear defects. Particles which are not desired for the working can be removed from the ion beam by means of a particle discriminator.

REFERENCES:
patent: 4367429 (1983-01-01), Wang et al.
patent: 4426582 (1984-01-01), Orlaff et al.
patent: 4457803 (1984-07-01), Takigawa
patent: 4567398 (1986-01-01), Ishitani et al.
patent: 4629931 (1986-12-01), Clerk et al.
patent: 4639301 (1987-01-01), Doherty et al.
patent: 4698236 (1987-10-01), Kellogg et al.
Garvin, et al., Applied Optics, "Ion Beam Micromachining of Integrated Optics Components", vol. 13, No. 3, Mar. 1973, pp. 455-459.

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