Chemistry: electrical and wave energy – Processes and products
Patent
1988-09-29
1990-08-14
Tufariello, T. M.
Chemistry: electrical and wave energy
Processes and products
C25D 344
Patent
active
049484753
ABSTRACT:
The invention provides an ion barrier formed of a high-purity electroplated aluminum layer (purity >99.99%) which preferably has a thickness of 10 to 20 .mu.m for use on structural parts and shapes of metals and nonmetals, in particular on polyolefins. If desired, the electroplated aluminum layer can be compacted and/or anodically oxidized by post-treatment. The electroplated aluminum layer prevents the intrusion of metal and nonmetal ions into nonmetals, particularly plastic (for example polyolefins), and their penetration to metal surfaces. The deposition of the electroplated aluminum layer occurs from aprotic, oxygen-free and anhydrous electrolyte media of the general formula M.sup.I X.2AlR.sub.3.nLsm, wherein M.sup.I is an alkali metal ion or a quaternary onium ion, X is a halogen ion, preferably F.sup.- or Cl.sup.-, R is an alkyl radical, preferably CH.sub.3, C.sub.2 H.sub.5, C.sub.3 H.sub.7 or C.sub.4 H.sub.9, Lsm is an aromatic solvent molecule, preferably toluene, ethyl benzene, xylene or a mixture thereof, and n=0 to 12, at a bath temperature of 50.degree. to 110.degree. C. and a current density of 0.5 to 10 A/dm.sup. 2 under intensive bath movement. The media may possibly be in the presence of an aromatic solvent.
REFERENCES:
patent: 4101386 (1978-07-01), Dotzer
Doetzer Richard
Iwantscheff Georg
Siemens Aktiengesellschaft
Tufariello T. M.
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