Ion and impurity concentration optimization in photorefractive m

Details Ion and impurity concentration optimization in photorefractive m Ion and impurity concentration optimization in photorefractive m

1996-07-05

1998-03-17

Henry, Jon W.

Optical: systems and elements

Holographic system or element

Having particular recording medium

359 3, 252584, 252582, G03H 128, G03H 104, G03H 118

Patent

active

057293643

ABSTRACT:
Ionic and impurity concentrations in a photorefractive holographic storage medium are optimized such that electronic and ionic Debye numbers match an expected grating wave number K, at fixing and recording temperatures, respectively. Simultaneous and sequential recording and fixing are evaluated. The photovoltaic effect is reduced, subject to response time and absorption constraints, by matching reduced and oxidized impurity concentrations.

REFERENCES:
patent: 3799642 (1974-03-01), Phillips et al.
patent: 3933504 (1976-01-01), Phillips et al.
patent: 3997350 (1976-12-01), Ikeo et al.
patent: 5335098 (1994-08-01), Leyva et al.
patent: 5440669 (1995-08-01), Rakuljic et al.
patent: 5493628 (1996-02-01), Lawandy

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