Ion and charged particle source for production of thin films

Details Ion and charged particle source for production of thin films Ion and charged particle source for production of thin films

2005-04-12

2005-04-12

Wells, Nikita (Department: 2881)

Radiant energy

Ionic separation or analysis

C250S282000, C250S283000, C250S288000, C250S3960ML, C250S42300F

Reexamination Certificate

active

06878930

ABSTRACT:
The present invention includes a delivery means of material to be deposited onto thin film surfaces with precise spatial, temporal, compositional, and energy resolution for controlled reactions, patterning (2-dimensional and 3-dimensional), and removal of materials or reaction products of materials from thin film surfaces. The device includes a near atmospheric pressure means of generating ions, ion clusters, or charged particles as a material form to deliver said materials onto substrate surfaces. The device relies on shaped, patterned, conformal ion lenses, and individually addressable lens elements of a lens arrays to create an integrated deposition system for printed patterns of thin films. The devices and methods provide a novel approach to delivering materials to a surface, removing materials from a surface, or creating new materials at or on the surface. These methods and devices may be used in applications of thin film deposition, micro-electronics and semi-conductor manufacturing, printing, surface interfacial layers, coating, painting, sample and reagent treatment, preparation for sensors, chemical analysis, and fabricating 2- and 3-dimensional structures and devices.

REFERENCES:
patent: 6683301 (2004-01-01), Whitehouse et al.
patent: 6744041 (2004-06-01), Sheehan et al.
patent: 6784424 (2004-08-01), Willoughby et al.

Affiliated with

Also associated with

Rating

Ion and charged particle source for production of thin films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion and charged particle source for production of thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion and charged particle source for production of thin films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3438557