Ion accelerator for use in ion implanter

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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250423R, 250396R, H01J 2310

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057290288

ABSTRACT:
An ion accelerator for use in an ion beam implanter. The accelerator forms milliampere beams of heavy ions such as boron and phosphorous in a configuration in which the terminal ion source is replaced by a neutral beam injector. The neutral beam is formed at ground by the conversion of a focused beam of positive ions to neutral ions in a charge exchange canal. The neutral beam so formed is stripped of one or more electrons in a gas or vapor filled canal in the high voltage terminal. A 180.degree. analyzing magnet located in the high voltage terminal analyzes and directs a selected charge state to an acceleration tube parallel to the neutral beam injection tube where the selected positive ions are accelerated to ground potential. To extend the energy range of the accelerator below the injection energy, a high voltage insulator is provided to insulate the ground end of the positive ion acceleration tube permitting the acceleration tube and terminal to be uniformly biased at a negative voltage to decelerate the beam to very low energies at a location close to the point of use. An accelerator assembly includes a 90.degree. analyzing magnet in the high voltage terminal.

REFERENCES:
patent: 2206558 (1940-07-01), Bennett
patent: 3136908 (1964-06-01), Weinman
patent: 3395302 (1968-07-01), Brown, Jr. et al.
patent: 3683287 (1972-08-01), Miessner
patent: 3786359 (1974-01-01), King
patent: 3956634 (1976-05-01), Tran et al.
patent: 5300891 (1994-04-01), Tokoro
P.H. Rose, "The Three-Stage Tandem Accelerator", Nucl. Instr. and Methods, vol. 11, No. 1, pp. 49-62, 1961. (No Month).
Gordon et al., "High Intensity Source of 20-keV Hydrogen Atoms", Rev. Sci. Inst., vol. 34, No. 9, pp. 963-970, 1963. (No Month).
Wittkower et al., "Injection of Intense Neutral Beams into a Tandem Accelerator", Rev. Sci. Inst., vol. 35, No. 1, pp. 1-11, 1964. (No Month).
P.H. Rose, "The production of Intense Neutral and Negative Ion Beams", Nucl. Instr. and Methods, vol. 28, No. 1, pp. 146-153, 1964. No Month.
Rose et al., "The Tandem as a Heavy Ion Accelerator", IEEE-Trans. Nuc. Sci. vol. NS-12. No. 3, pp. 251-256, 1965. No Month.
Wittkower et al., "Equilibrium-Charge State Distributions of Energetic Ions (Z>1) In Gaseous and Solid Media", Atomic Data vol. 5, No. 2, pp. 113-166, 1973. No Month.
P.H. Rose, "Implantation at Energies Above 150keV", Nucl. Instr. and Methods, B35, pp. 535-540, 1988. No Month.
K.H. Purser, "A High Throughput .sup.14 C Accelerator Mass Spectrometer", Radiocarbon, vol. 34, No. 3, pp. 458-467, 1992. No Month.
O'Connor et al., "Performance characteristics of the Genus Inc. 1510 high energy ion implantation system", Nucl. Instr. and Methods, B74, pp. 18-26, 1993. No Month.
Adam et al., "Zeitschrift fur Ingenieure aller Fachrichtungen" Kerntechnik, Istopentechnik Und-Chemie, Packard Instrument International SA, Jun. 1962.

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