Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1987-04-20
1988-03-22
Lacey, David L.
Coating apparatus
Gas or vapor deposition
Multizone chamber
118725, 156613, 156DIG98, C23C 1600
Patent
active
047321105
ABSTRACT:
A chemical vapor deposition (CVD) reactor system is described comprising a substantially vertical reactor tube having a gas inlet and a gas outlet, a pedestal mounted within the reactor tube having a structure for securing a substrate thereto so that a surface of the substrate is exposed downward, and apparatus for providing a gas mixture to the reactor tube, the gas mixture being introduced into the reactor tube via the gas inlet and subsequently withdrawn via the gas outlet, the gas inlet and outlet being positioned, with respect to the substrate, below and above, respectively. The gas mixture is maintained in substantially uniform plug flow as it is directed into close proximity to the exposed surface of the substrate. This permits the CVD growth of physically uniform layers, both in terms of thickness and composition, having low contamination concentrations over large substrate surface areas.
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Denson-Low Wanda K.
Hughes Aircraft Company
Karambelas A. W.
Lacey David L.
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