Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1992-08-21
1994-04-12
Rosasco, Steve
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430311, 430312, 430314, 430322, G03F 900
Patent
active
053024770
ABSTRACT:
A phase-shifted reticle with patterns proximate each other having inverted phases for the features and phase-shifting elements, and methods of fabricating the reticle, are disclosed. In a preferred embodiment, the inverted reticle is used to form an array of closely spaced contact or via openings. For a first pattern on the reticle, the feature will be the 0.degree. phase and the phase-shifting rim surrounding that feature will be the 180.degree. phase. All patterns surrounding the first pattern have phase-shifting rims of the 0.degree. phase and features of the 180.degree. phase. In this way, each pattern can form below conventional resolution features in the resist. Additionally, there will not be exposure of the regions between the closely spaced features since radiation transmitted through the closely spaced phase-shifting rims of the two patterns is 180.degree. out of phase.
REFERENCES:
patent: 4231811 (1980-11-01), Somekh et al.
patent: 4890309 (1989-12-01), Smith et al.
Neureuther A. R., Sep. 26, 1990, BACUS Symposium, pp. 1-6.
Dao Giang T.
Fujimoto Harry H.
Rodriguez Ruben A.
Intel Corporation
Rosasco Steve
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