Inversion-type FED method

Etching a substrate: processes – Forming or treating optical article

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

216 25, 216 76, B44C 122

Patent

active

055782256

ABSTRACT:
A field emission display that may be viewed through the back plate, thus providing increased luminous efficiency, and methods for making such a display, are described. A glass substrate is provided as a base for the display faceplate. There is a reflective, conductive layer over the glass substrate. A phosphor layer is formed over the reflective, conductive layer. A second glass substrate acts as a transparent base for the display baseplate, which is mounted opposite and parallel to the faceplate. A first transparent insulating layer is formed over the second glass substrate. There are parallel, transparent cathode electrodes with auxiliary metal electrodes, over the first insulating layer. Parallel, transparent gate electrodes are formed over, separate from, and orthogonally to the parallel, transparent cathode electrodes, and also have auxiliary metal electrodes. A second transparent insulating layer is between the gate electrodes and the cathode electrodes. A plurality of openings extend through the second insulating layer and the gate electrodes. At each opening is a field emission microtip connected to and extending up from a cathode electrode, whereby electrons may be selectively emitted from each microtip to form a display image on the faceplate phosphor layer, which is viewable through the baseplate.

REFERENCES:
patent: 5216324 (1993-06-01), Curtin
patent: 5461009 (1995-10-01), Huang et al.
patent: 5492234 (1996-02-01), Fox, III
"Improvement of Luminance And Luminous Efficiency of Surface-Discharge Color As PDP", By T. Shinoda et al, in SID 1991 Digest, pp. 724-727.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Inversion-type FED method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inversion-type FED method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inversion-type FED method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1970602

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.