Introduction of an intermediary refractive layer for...

Details Introduction of an intermediary refractive layer for... Introduction of an intermediary refractive layer for...

2006-06-29

2008-08-26

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S067000, C378S034000, C378S035000

Reexamination Certificate

active

07417707

ABSTRACT:
An intermediary layer is introduced between a lens and a wafer for an immersion lithography process. A non-supercritical gas is provided and condensed to form a layer of liquid between the lens and the wafer. The substrate may be irradiated through the lens and intermediary layer. In addition, the intermediary layer may then be evaporated. The non-supercritical gas may include superheated steam which may be condensed to form a layer of water between the lens and the wafer. The wafer may be irradiated with one of a EUV light and UV light. A system for introduction of an intermediary layer between a lens and a wafer for an immersion lithography process is also provided. The wafer for use in the immersion lithography process may includes a hydrophobic and hydrophilic surfaces to provide enhanced contact angles between the wafer and the intermediary liquid layer condensed on the wafer and to reduce light aberration provided from a light source through the intermediary liquid layer.

REFERENCES:
patent: 2006/0033898 (2006-02-01), Cadee et al.
patent: 2006/0285096 (2006-12-01), Jacobs et al.
patent: WO2004112108 (2004-12-01), None

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