Interrupting charge integration in semiconductor imagers exposed

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357 2315, 357 30, 357 49, 357 80, H01L 2978, H01L 2714, H01L 3100, H01L 2712

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active

047164476

ABSTRACT:
Charge integration is selectively interrupted in a semiconductor imager with thinned substrate, by modulating the electric field normal to its back-illuminated surface. This suppresses smear generated during field transfer in certain types of imager when exposed to high-energy images, for example. The thinned substrate is cemented with an electrically insulating epoxy to a glass backing plate bearing a transparent electrode, the potential on which is varied to modulate the drift field.

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