Interrupted polysilanes useful as photoresists

Details Interrupted polysilanes useful as photoresists Interrupted polysilanes useful as photoresists

1986-09-23

1988-08-02

Marquis, Melvyn I.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

430269, 430272, 430326, 528 10, 528 25, 528 28, 528 33, 528 34, 556430, C08G 7722

Patent

active

047614641

ABSTRACT:
Polysilane polymers in which the Si backbone is interrupted by atoms such as O, Ge, Sn, P, etc., are useful photoresists especially in the solvent development mode.

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