Coating processes – Coating by vapor – gas – or smoke – Carbon or carbide coating
Patent
1990-09-13
1992-06-23
Lusigman, Michael
Coating processes
Coating by vapor, gas, or smoke
Carbon or carbide coating
427 50, 427122, 4272557, 427402, C23C 1600
Patent
active
051241790
ABSTRACT:
The method for depositing multilayers of PCD film onto the substrate comprises chemically depositing a polycrystalline diamond layers onto the substrate at deposition temperatures in the range of 650.degree. to 825.degree. C., interrupting the deposition process with a cool-down step and then depositing at least one other layer under the same deposition conditions. The method enables one to deposit PCD films having a thickness of at least 12 microns for applications on flat as well as curved substrates having wide use in the electronics industry. Thick PCD films of this invention have been found to be ideal for dissipating heat from radio frequency (RF) and microwave (MW) devices.
REFERENCES:
Morrison et al, "Optical characteristics of diamond grown by plasma assisted chemical vapor deposition," SPIE vol. 1112 Window and Dome Technologies and Materials (1989) pp. 186-191.
Taborek, "Optical properties of microcrystalline CVD diamond" SPIE vol. 1112 Window and Dome Technologies Materials (1989) pp. 205-211.
Dyer Paul N.
Garg Diwakar
Iampietro Robert L.
Lynn Sui-Yuan
Wrecsics Ernest L.
Diamonex Incorporated
King Roy V.
Lusigman Michael
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