Internal reactor method for chemical vapor deposition

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

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4272553, 427255, C23C 1600

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active

049577808

ABSTRACT:
A chemical vapor deposition process in which an internal reactor is disposed within a chemical vapor deposition reactor including means for enclosing a reaction chamber and means for heating the reaction chamber. The position at which the internal reactor is disposed relative to the heating means is selected to provide control of the temperature within the internal reactor. At least two solid precursor materials are placed in the internal reactor and are contacted with at least one precursor gas, reactive with the solid precursor materials to produce at least two reactant gases. These gases are directed to the reaction chamber to react with one or more additional reactants.

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