Internal reactor for chemical vapor deposition

Details Internal reactor for chemical vapor deposition Internal reactor for chemical vapor deposition

1988-06-14

1990-01-02

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118725, 118726, C23C 1600

Patent

active

048905747

ABSTRACT:
A CVD apparatus including an internal reactor for in-situ generation of source gases for the CVD reaction. The internal reactor comprises a shell for containing solid precursor material, inlet and outlet means for a precursor gas and the gaseous product respectively, and preferably gas distribution means and means for preventing entrainment of the solid precursor in the gas flow. The internal reactor is positioned within the CVD reactor to provide the optimum temperature for the reaction taking place within the internal reactor.

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