Intermittent film deposition method and system

Details Intermittent film deposition method and system Intermittent film deposition method and system

1991-08-16

1992-09-01

Beck, Shrive

Coating processes

Measuring, testing, or indicating

427294, 427345, 4274343, 4274301, 118693, 118602, 118402, 118403, 118429, B05D 120

Patent

active

051437457

ABSTRACT:
A method and apparatus for continuously forming and depositing a layer of monomolecular amphiphilic molecules on a substrate, which include the continuous or intermittent removal of unused film after a substrate dipping. The amount of "dwell time" in which the film resides on the surface of the support media is controlled. A rotatable barrier provides a movable "film front" to achieve repeatable film pressures, consistencies and viscosities of high precision and accuracy.

REFERENCES:
patent: 4093757 (1978-06-01), Barraud et al.
patent: 4646678 (1987-03-01), Grunfeld
patent: 4722856 (1988-02-01), Albrecht et al.
patent: 5035200 (1991-06-01), Moriyama et al.

Affiliated with

Also associated with

Rating

Intermittent film deposition method and system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Intermittent film deposition method and system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Intermittent film deposition method and system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-766576