Intermediate workpiece employing a mask for etching an aperture

Details Intermediate workpiece employing a mask for etching an aperture Intermediate workpiece employing a mask for etching an aperture

1995-12-21

1997-12-16

Niebling, John

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

437228, 148DIG51, 148 333, 257628, 257774, C23F 102

Patent

active

056980639

ABSTRACT:
A method for differentially etching an N-sided polygon aperture through a first major surface of a <100> silicon wafer along the <111> planes begins with depositing a mask and defining therein a first intermediate polygon aperture having at least 4N+2 sides, where N is a positive integer. At least one side is generally parallel to the <110> plane, and the intersection of a second side and a third side of the first intermediate polygon is located generally along a major crystal axis perpendicular to the <110> plane. The included angle between the second and third sides expands during anisotropic etching to form one of the N sides of the polygon located along the major axis perpendicular to the <110> plane.

REFERENCES:
patent: 3770533 (1973-11-01), Zwicker
patent: 3977925 (1976-08-01), Schwabe
patent: 3986200 (1976-10-01), Allison
patent: 4007464 (1977-02-01), Bassous et al.
patent: 4397711 (1983-08-01), Donnelly et al.
patent: 4470875 (1984-09-01), Poteat
patent: 4733823 (1988-03-01), Waggener et al.
patent: 5021364 (1991-06-01), Akamine et al.
patent: 5254209 (1993-10-01), Schmidt et al.
patent: 5308442 (1994-05-01), Taub et al.
patent: 5338400 (1994-08-01), Jerman
patent: 5484507 (1996-01-01), Ames

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