Interferometry system error compensation in twin stage...

Details Interferometry system error compensation in twin stage... Interferometry system error compensation in twin stage...

2005-08-02

2005-08-02

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

06924896

ABSTRACT:
Techniques for monitoring the position of a stage in a twin stage lithography tool are disclosed.

REFERENCES:
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patent: 6211965 (2001-04-01), Tsuchiya et al.
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patent: 6665054 (2003-12-01), Inoue
patent: 6777143 (2004-08-01), Lin
patent: 6785005 (2004-08-01), Inoue

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