Interferometrically controlled stage with precisely orthogonal a

Details Interferometrically controlled stage with precisely orthogonal a Interferometrically controlled stage with precisely orthogonal a

1980-10-20

1982-01-19

Smith, Alfred E.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, G01B 1100, G01B 1102

Patent

active

043113907

ABSTRACT:
A projection lens is mounted between a movable stage and a stationary holder to project an image of a reticle held by the holder onto a semiconductive wafer held by a chuck mounted on the stage. The stage is movable along orthogonal X and Y axes in a horizontal plane to align different regions of the semiconductive wafer with the projected image of the reticle. First and second movable plane mirrors fixedly mounted on the stage for movement therewith are symmetrically disposed relative to the Y axis in first and second vertical planes intersecting one another at the Y axis. Similarly, first and second stationary plane mirrors fixedly mounted on a housing of the projection lens are disposed parallel to the first and second movable mirrors, respectively. As the stage is moved along the X and Y axes, first and second interferometer systems provide first and second measurement signals indicative of the velocities of the first and second movable mirrors (relative to the first and second stationary mirrors) while they are being moved along first and second measurement paths normal to the first and second movable mirrors, respectively. In response to the difference and the sum of these measurement signals, first and second position control circuits move the stage along precisely orthogonal X and Y axes with the Y axis bisecting the angle between the first and second movable mirrors.

REFERENCES:
patent: 3786332 (1974-01-01), Hepner et al.
patent: 3791739 (1974-02-01), Kawasaki
patent: 3815996 (1974-06-01), Colding et al.
patent: 3926523 (1975-12-01), Chapman
patent: 4053231 (1977-10-01), Fletcher et al.

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