Interferometric topological metrology with pre-established...

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

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Reexamination Certificate

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07136168

ABSTRACT:
A method is described that involves measuring a first set of interferometer fringe line disturbances against pre-determined measurement scale information in order to generate a first set of profiles that describe the topography of a sample that is placed upon a sample stage associated with the interferometer. The first set of profiles map to traces that run over a first axis of the sample and the sample stage. The traces have a recognized spacing between one another along a second axis of the sample and the sample stage. The method also involves adjusting the relative position of the traces to the sample so as to create a second set of fringe line disturbances. The method also involves measuring, the second set of interferometer fringe line disturbances against the pre-determined measurement scale information in order to generate a second set of profiles that describe the topography of the sample. The method also involves interleaving the first set of profiles and the second set of profiles to create a topography description of the sample that has a resolution along the second axis that is smaller than the spacing.

REFERENCES:
patent: 3612693 (1971-10-01), Stetson
patent: 4188122 (1980-02-01), Massie et al.
patent: 4340306 (1982-07-01), Balasubramanian
patent: 4815856 (1989-03-01), Bruce
patent: 4832489 (1989-05-01), Wyant et al.
patent: 4957367 (1990-09-01), Dulman
patent: 5243542 (1993-09-01), Noguchi
patent: 5432606 (1995-07-01), Noguchi et al.
patent: 5452953 (1995-09-01), Ledger
patent: 5523842 (1996-06-01), Yasuda et al.
patent: 5889592 (1999-03-01), Zawaideh
patent: 5969815 (1999-10-01), Toida et al.
patent: 5987189 (1999-11-01), Schmucker et al.
patent: 5999262 (1999-12-01), Dobschal et al.
patent: 6147764 (2000-11-01), Handa
patent: 6288782 (2001-09-01), Worster et al.
patent: 6344898 (2002-02-01), Gemma
patent: 6493093 (2002-12-01), Harasaki et al.
patent: 6731391 (2004-05-01), Kao et al.
patent: 6999181 (2006-02-01), Dulman
patent: 2003/0112446 (2003-06-01), Miller et al.
patent: 2004/0027582 (2004-02-01), Dulman
patent: 2004/0027583 (2004-02-01), Dulman
patent: WO 00/49364 (2000-08-01), None

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