Interferometric surface contour measuring arrangement

Details Interferometric surface contour measuring arrangement Interferometric surface contour measuring arrangement

1981-08-24

1983-07-05

Bauer, Edward S.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356237, G01B 1124

Patent

active

043915264

ABSTRACT:
An arrangement for interferometrically recording in a single interferogram a full development of the contour of a symmetrical reflective surface, such as an internal or external cylindrical or conical surface. An optical system projects a light wave onto the reflective surface such that a reflected wave is formed. The reflected wave is interfered with a reference light wave to generate an interference pattern, and only a selected portion of the interference pattern is projected onto a film medium for recording. The reflective surface is scanned with the projected wave by relatively moving the projected wave relative to the surface, and synchronously therewith, the projected interference pattern is moved relative to the recording medium in a manner such that the information recorded on the film medium is a full development of the contour of the reflective surface.

REFERENCES:
patent: 3680966 (1972-08-01), Cofek et al.
patent: 3761186 (1973-11-01), Wason
patent: 3907438 (1975-09-01), Holeman
patent: 4022532 (1977-05-01), Montagnino
patent: 4197011 (1980-04-01), Hudson
Zielinski, "Unequal Path Interferometer Alignment and Use", Optical Engineering, vol. 18, No. 5, pp. 429-482, 10/79.
Hayes et al., "Testing of Nonlinear Diamond-Turned Reflaticons", Applied Optics, vol. 20, No. 2, pp. 235-239, 1/81.

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