Interferometric stage system

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

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C356S508000

Reexamination Certificate

active

06912054

ABSTRACT:
an apparatus including: a support structure; a stage configured to move relative to the support structure; a first reflection surface carried by one of the support structure and the stage; and a first interferometry system. The first interferometry system is configured to direct a first measurement beam to contact the first reflection surface and monitor changes in the position and orientation of the stage relative to the support structure along multiple degrees of freedom using the first measurement beam and no other measurement beam that contacts the first reflection surface. For example, the first measurement beam can define a first measurement axis and the multiple degrees of freedom can include at least two of: distance along the first measurement axis, pitch about the first measurement axis, and yaw about the first measurement axis.

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