Interferometric stage metrology system

Details Interferometric stage metrology system Interferometric stage metrology system

2005-03-15

2005-03-15

Allen, Stephone B. (Department: 2878)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S500000

Reexamination Certificate

active

06867867

ABSTRACT:
Interferometric apparatus and methods by which the local surface characteristics of photolithographic mirrors or the like may be interferometrically measured in-situ to provide correction signals for enhanced distance and angular measurement accuracy. Surface characterizations along one or multiple datum lines in one or more directions may be made by measuring the angular changes in beams reflected off the surfaces during scanning operations to determine local slope and then integrating the slope to arrive at surface topology. The mirrors may be mounted either on the photolithographic stages or off the photolithographic stages on a reference frame.

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