Interferometric modulation of radiation

Details Interferometric modulation of radiation Interferometric modulation of radiation

2005-03-15

2005-03-15

Sugarman, Scott J. (Department: 2873)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C359S291000

Reexamination Certificate

active

06867896

ABSTRACT:
In one embodiment the invention provides an interferometric modulator comprising a cavity defined by two walls held by a support. The support comprises two materials such that the electrical or mechanical properties of the mechanical support differ at different locations in a cross-section of the mechanical support.

REFERENCES:
patent: 2534846 (1950-12-01), Ambrose et al.
patent: 3439973 (1969-04-01), Paul et al.
patent: 3443854 (1969-05-01), Weiss
patent: 3653741 (1972-04-01), Marks
patent: 3656836 (1972-04-01), de Cremoux et al.
patent: 3813265 (1974-05-01), Marks
patent: 3955880 (1976-05-01), Lierke
patent: 4099854 (1978-07-01), Decker et al.
patent: 4228437 (1980-10-01), Shelton
patent: 4377324 (1983-03-01), Durand et al.
patent: 4389096 (1983-06-01), Hori et al.
patent: 4403248 (1983-09-01), Te Velde
patent: 4445050 (1984-04-01), Marks
patent: 4459182 (1984-07-01), te Velde
patent: 4519676 (1985-05-01), te Velde
patent: 4531126 (1985-07-01), Sadones
patent: 4663083 (1987-05-01), Marks
patent: 4681403 (1987-07-01), Te Velde et al.
patent: 4748366 (1988-05-01), Taylor
patent: 4786128 (1988-11-01), Birnbach
patent: 4790635 (1988-12-01), Apsley
patent: 4900395 (1990-02-01), Syverson et al.
patent: 4982184 (1991-01-01), Kirkwood
patent: 5022745 (1991-06-01), Zayhowski et al.
patent: 5044736 (1991-09-01), Jaskie et al.
patent: 5075796 (1991-12-01), Schildkraut et al.
patent: 5078479 (1992-01-01), Vuilleumier
patent: 5124834 (1992-06-01), Cusano et al.
patent: 5142414 (1992-08-01), Koehler
patent: 5153771 (1992-10-01), Link et al.
patent: 5168406 (1992-12-01), Nelson
patent: 5228013 (1993-07-01), Bik
patent: 5231532 (1993-07-01), Magel et al.
patent: 5233459 (1993-08-01), Bozler et al.
patent: 5293272 (1994-03-01), Jannson et al.
patent: 5311360 (1994-05-01), Bloom et al.
patent: 5326430 (1994-07-01), Cronin et al.
patent: 5358601 (1994-10-01), Cathey
patent: 5381253 (1995-01-01), Sharp et al.
patent: 5401983 (1995-03-01), Jokerst et al.
patent: 5459610 (1995-10-01), Bloom et al.
patent: 5497172 (1996-03-01), Doherty et al.
patent: 5500635 (1996-03-01), Mott
patent: 5500761 (1996-03-01), Goossen et al.
patent: 5526327 (1996-06-01), Cordova, Jr.
patent: 5552925 (1996-09-01), Worley
patent: 5579149 (1996-11-01), Moret et al.
patent: 5619059 (1997-04-01), Li et al.
patent: 5629790 (1997-05-01), Neukermans et al.
patent: 5636052 (1997-06-01), Arney et al.
patent: 5636185 (1997-06-01), Brewer et al.
patent: 5673139 (1997-09-01), Johnson
patent: 5683591 (1997-11-01), Offenberg
patent: 5703710 (1997-12-01), Brinkman et al.
patent: 5710656 (1998-01-01), Goossen
patent: 5726480 (1998-03-01), Pister
patent: 5739945 (1998-04-01), Tayebati
patent: 5784190 (1998-07-01), Worley
patent: 5793504 (1998-08-01), Stoll
patent: 5808780 (1998-09-01), McDonald
patent: 5825528 (1998-10-01), Goossen
patent: 5835255 (1998-11-01), Miles
patent: 5943158 (1999-08-01), Ford et al.
patent: 6055090 (2000-04-01), Miles
patent: 6100872 (2000-08-01), Aratani et al.
patent: 6243149 (2001-06-01), Swanson et al.
patent: 0667548 (1995-08-01), None
patent: 405275401 (1993-10-01), None
patent: WO 9530924 (1995-11-01), None
Winters, et al.The etching of silicon with XeF2vapor. Applied Physics Letters, vol. 34, No. 1, Jan. 1979, pp. 70-73.
Ibotson, et al.Comparison of XeF2and F-atom reactions with Si and SiO2. Applied Physics Letters, vol. 44, No. 12, Jun. 1984, pp. 1129-1131.
Williams, et al.Etch Rates for Micromatching Processing. Journal of Microelectromechanical Systems, vol. 5, No. 4, Dec. 1996, pp. 256-269.
Schnakenberg, et al.Tmahw Etchants for Silicon Micromachining. 1991 International Conference on Solid State Sensors and Actuators—Digest of Technical Papers. Pp. 815-818.
“Light Over Matters,” Jun. 1993, Circle No. 36.
Akasaka, “Three-Dimensional IC Trends,” Proceedings of IEEE, vol. 74, No. 12, Dec. 1986, pp. 1703-1714.
Aratani, et al., “Process and Design Considerations for Surface Micromachined Beams for a Tuneable Interferometer Array in Silicon,” Proc. IEEE, Microelectromechanical Workshop, Ft. Lauderdale, FL, Feb. 7-10, 1993, p. 230, et. seq.
Aratani, K. et al. “Surface micromachined tuneable interferometer array,”Sensors and Actuators, 1994, pp. 17-23.
Conner, “Hybrid Color Display Using Optical Interference Filter Array,” SID Digest, 1993, pp. 577-580.
Goosen, et al., “Possible Display Applications of the Silicon Mechanical Anti-Reflection Switch,” Society for Information Display, 1994.
Goosen, et al., “Silicon Modulator Based on Mechanically-Active Anti-Reflection Layer with One M Bit/Sec Capability for Fiber-in-the-Loop Applications,” IEEE, Photonic Technology Letters, Sep. 1994.
Gosch, “West Germany Graps the Lead in X-Ray Lithography,”Electronics, Feb. 5, 1987, pp. 78-80.
Howard, “Nanometer-Scale Fabrication Techniques,”VLSI Electronics: Microstructure Science, vol. 5 1982, pp. 145-153, pp. 166-173.
Ibotson, et al. Comparison of XeF2, and F-atom reactions with Si and siO2, Applied Physics Letters. vol. 44, No. 12, Jun. 1984. pp. 1129-1131.
Jackson, “Classical Electrodynamics,” John Wiley & Sons, Inc., pp. 568-573.
Jerman, et al., “A Miniature Fabry-Perot Interferometer with a Corrugated Silicon Diaphram Support,” Sensors and Actuators A, 1991, vol. 29, p. 151.
Johnson, “Optical Scanners.” Microwave Scanning Antennas, vol. 1 p. 251 et seq.
Miles, Mark, W., “A New Reflective FPD Technology Using Interferometric Modulation,” Society for Information Display '97 Digetst, Session 7.3.
Newsbreak, “Quantum-trench devices might operate at terahertz frequencies,” Laser Focus World May 1993.
Oliner, “Radiating Elements and Mutual Coupling.”Microwave Scanning Antennas, vol. 2, p. 131 et seq.
Raley, et al., “A Febry-Perot Microferometer for Visible Wave Lengths,” IEEE Solid-State Sensor and Actuator Workshop, Jun. 1992, Hilton Head, SC.
Schnakenberg, et al. Tmahw Etchants for Silicon Micromachining. 1991 International Conference on Solid State Sensors and Actuators -Digest of Technical Papers. pp. 815-818.
Sperger, et al., “High Performance Patterned All-Dialectric Interference Colour Filter for Display Applications,” SID Digest, 1994.
Stone, “Radiation and Optics, An Introduction to the Classical Theory,” McGraw-Hill pp. 340-343.
Walker, et al., “Electron-Beam-Tunable Interference Filter Spatial Light Modulator,” Optics Letters, vol. 13, No. 5, 1988, p. 345, et seq.
Williams, et al. Etch Rates for Micromachining Processing -Journal of Microelectromechanical Systems. vol. 5 No. 4, Dec. 1996, pp. 256-269.
Winters, et al., The etching of silicon with XeF2 vapor. Applied Physics Letters, vol. 34. No. 1, Jan. 1979, pp. 70-73.
Winton, John M., “A novel way to capture solar energy,” chemical Week, May 15, 1985.
Wu, “Design of a Reflective Color LCD Using Optical Interference Reflectors,” ASIA, Asia Display, Oct. 16, 1995, pp. 929-931.

Affiliated with

Also associated with

Rating

Interferometric modulation of radiation does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Interferometric modulation of radiation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Interferometric modulation of radiation will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3432585