Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2007-05-01
2007-05-01
Lee, Hwa (Andrew) (Department: 2877)
Optics: measuring and testing
By light interference
For dimensional measurement
Reexamination Certificate
active
11017632
ABSTRACT:
An apparatus including: (i) an interferometer positioned to derive measurement and reference wavefronts from a source of electromagnetic radiation, wherein the interferometer is configured to direct the measurement wavefront to reflect from a measurement surface and the reference wavefront to reflect from a reference surface, and further directs reflected measurement and reflected reference wavefronts to overlap with one another and to form an interference pattern; (ii) an auxiliary optic having a curved reflective surface positioned to redirect the measurement wavefront between the interferometer and the measurement surface; and (iii) a translation stage, wherein paths for the measurement and reference wavefronts define an optical measurement surface corresponding to a theoretical test surface that would reflect the measurement wavefront to produce a zero optical path length difference between the measurement and reference wavefronts, and wherein the translation stage is configured to scan the optical measurement surface over the measurement surface.
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Colonna De Lega Xavier
McFee Charles
Lee Hwa (Andrew)
Zygo Corporation
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