Interferometric dimensional measurement and defect detection met

Details Interferometric dimensional measurement and defect detection met Interferometric dimensional measurement and defect detection met

1988-05-31

1989-07-04

Willis, Davis L.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356358, 356359, 356237, G01B 902

Patent

active

048446165

ABSTRACT:
The invention is a method for detecting both surface topography and defect presence using an AC interferometer. Surface topography measurements are maximized by adjusting the signal voltage of the light modulator to a relative phase-sensitive value. Defect detection is maximized by adjusting the signal voltage of the light modulator to a relatively phase-insensitive value. This method not only allows for heretofore unknown defect detection by an AC interferometer but, because the signal voltage can be switched electronically, permits both observations to be taken at a high speed and for many points of a specimen, thereby making the method suitable for the manufacturing environment. More specifically, the method would be applicable to both optical disk and microchip manufacturing.

REFERENCES:
patent: 4280766 (1981-07-01), Goss
patent: 4286878 (1981-09-01), Pircher
patent: 4298283 (1981-11-01), Makosch et al.
patent: 4358201 (1982-11-01), Makosch
patent: 4552457 (1985-11-01), Giallorenzi et al.
patent: 4652744 (1987-03-01), Bowers et al.
patent: 4714348 (1987-12-01), Makosch
SPIE vol. 316 High Resolution Soft X-Ray Optics (1981) "Surface Profiling by Electro-Optical Phase Measurements", by G. Makosch et al. pp. 42-53.
Photographic Sciences Corporation, 1987, "MP2000 Non-Contact Surface Profiler".

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