Interferometric apparatus for measuring a physical value

Optics: measuring and testing – By particle light scattering – With photocell detection

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356358, G01B 902

Patent

active

057574898

ABSTRACT:
The displacement of the stage of an exposure apparatus can be measured by obtaining the phase difference between a light beam reflected by a stationary mirror and a light beam reflected by a movable mirror placed on the stage. This apparatus calculates the position data of the stage at second time by using the position data of the stage at first time which is measured by using first and second frequencies, the position data of the stage at the first time which is measured by using a third frequency, and the position data of the stage at the second time which is measured by using the third frequency.

REFERENCES:
patent: 4948254 (1990-08-01), Ishida
patent: 5153669 (1992-10-01), DeGroot
patent: 5404222 (1995-04-01), Lis

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