Optics: measuring and testing – By particle light scattering – With photocell detection
Patent
1998-06-24
2000-09-19
Kim, Robert H.
Optics: measuring and testing
By particle light scattering
With photocell detection
356358, G01B 902
Patent
active
061220582
ABSTRACT:
In an interferometer system, variations of the refractive index in the medium traversed by the measuring beam (123) can be detected by using two measuring beams (123, 125) having wavelengths which differ by a factor of three. For this choice of the wavelength ratio, the interference filters of the polarization elements, such as the beam splitter (127), the .lambda./4 plates (130, 131) and the antireflection coatings can be manufactured relatively easily, and the detection accuracy is increased.
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"Linear/Angular Displacement Interferometer For Wafer Stage Metrology", Gary E. Sommargren, SPIE Proc. vol. 1088, pp. 268-272.
Belien Philippe J. L.
Rijpers Johannes C. N.
van der Werf Jan E.
ASM Lithography B.V.
Kim Robert H.
Lee Andrew H.
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