Interference system and semiconductor exposure apparatus...

Details Interference system and semiconductor exposure apparatus... Interference system and semiconductor exposure apparatus...

2005-11-01

2005-11-01

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

06961132

ABSTRACT:
An exposure apparatus for exposing a substrate with a pattern of an original includes a projection optical system for projecting the pattern of the original onto the substrate with light from a light source, and an interferometer for measuring an optical characteristic of the projection optical system by use of the light from the light source, which passes a pinhole and the projection optical system. The pinhole has a diameter which is smaller than a diameter of an Airy disc.

REFERENCES:
patent: 4627731 (1986-12-01), Waters et al.
patent: 4938596 (1990-07-01), Gauthier et al.
patent: 5815268 (1998-09-01), LaFleur
patent: 5898501 (1999-04-01), Suzuki et al.
patent: 6037579 (2000-03-01), Chan et al.
patent: 6266147 (2001-07-01), Naulleau
patent: 6456382 (2002-09-01), Ichihara et al.
patent: 6614535 (2003-09-01), Kakuchi et al.
patent: 6633362 (2003-10-01), Murakami et al.
patent: 6661522 (2003-12-01), Ouchi
patent: 2001/0026367 (2001-10-01), Magome

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