Interference pattern testing of materials

Details Interference pattern testing of materials Interference pattern testing of materials

2007-06-12

2007-06-12

Raymond, Edward (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Mechanical measurement system

C356S512000

Reexamination Certificate

active

11173700

ABSTRACT:
Methods, systems, and articles of manufacture consistent with the present invention identify a flaw in a structure by comparing a first interference pattern resulting from a first wave signal and a second wave signal propagating through the structure to a second interference pattern resulting from the first wave signal and the second wave signal propagating through the structure. The second interference pattern is obtained after obtaining the first interference pattern. It is determined whether there is a flaw in the structure by determining whether the first interference pattern deviates from the second interference pattern by a predetermined variance.

REFERENCES:
patent: 2006/0187465 (2006-08-01), De Groot

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