Interfacial plasma bars for photovoltaic deposition apparatus

Details Interfacial plasma bars for photovoltaic deposition apparatus Interfacial plasma bars for photovoltaic deposition apparatus

1991-03-11

1993-01-19

Hearn, Brian E.

Coating apparatus

Gas or vapor deposition

Running length work

118719, 118723, 118724, 427570, C23C 1650, C23C 1654

Patent

active

051804344

ABSTRACT:
In continuous apparatus for the glow discharge deposition of amorphous silicon alloy solar cells of p-i-n-type configuration in a plurality of interconnected, dedicated deposition chambers, a plasma bar operatively disposed between at least the plasma regions in which the layer pairs of amorphous silicon alloy material defining the major semiconductor junction of the solar cell are deposited. The plasma bar is adapted to initiate a plasma so as to prevent chemically adsorbed contaminants from deleteriously affecting the surface of the first deposited of the layer pair, thereby improving the open circuit voltage of the solar cell. In a similar manner, the plasma bar may also be provided between the layer pairs of amorphous silicon alloy material which combine to define the minor semiconductor junction of the solar cell. Finally, a plasma bar may be disposed between the oxide-based layer of a back reflector for reducing oxygen contamination of the silicon alloy material deposited thereupon.

REFERENCES:
patent: 4479455 (1984-10-01), Doehler et al.

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