Interconnection structure and methods

Static information storage and retrieval – Interconnection arrangements

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C365S051000, C365S103000, C365S105000

Reexamination Certificate

active

06661691

ABSTRACT:

FIELD OF THE INVENTION
This application relates to interconnection structures especially useful in semiconductor devices such as integrated circuits and memory devices and relates to methods for fabricating and using such structures.
BACKGROUND ART
Integrated circuits including arrays of memory nodes or logic gates have increased steadily in density. Such integrated circuits have included dynamic random access memory (DRAM) devices, static random access memory (SRAM) devices, programmable read-only memory (PROM) integrated circuits, electrically erasable programmable read-only memory (EEPROM) integrated circuits, write-once read-many (WORM) memory devices, and logic devices such as programmable logic array (PLA) integrated circuits, among others. Integrated circuits having arrays of devices, gates, or memory nodes disposed on multiple levels require “vertical” interconnections or “pillars” to interconnect devices, gates, or memory nodes on one level with other devices, gates, or nodes on other levels. In this context, the term “vertical” differs from its everyday connotation in that it does not refer to the direction of gravity. Throughout this specification, the drawings, and the appended claims, the term “vertical” refers to a direction generally perpendicular to a substrate or base plane of an integrated circuit. Also, the term “pillar” referring to an interconnection and the term “vertical interconnection” are used interchangeably to mean an interconnection communicating between different layers of an integrated circuit, regardless of the spatial orientation of those different layers. Integrated circuits herein include not only monolithic integrated circuits, but also hybrid integrated circuits and multi-layer or “stacked” modules. The term “cell” herein refers to a functional element of an array, such as a memory node, a logic gate, a switching device, a field-effect device, or a semiconductor device.
There is a continuing need for increased device density in integrated circuits, including multi-layer integrated circuits and for efficient interconnection structures within such multi-layer integrated circuits.


REFERENCES:
patent: 3271591 (1966-09-01), Ovshinsky
patent: 3530441 (1970-09-01), Ovshinsky
patent: 3641516 (1972-02-01), Castrucci et al.
patent: 4499557 (1985-02-01), Holmberg et al.
patent: 4599705 (1986-07-01), Holmberg et al.
patent: 5335219 (1994-08-01), Ovshinsky et al.
patent: 5625220 (1997-04-01), Liu et al.
patent: 5659500 (1997-08-01), Mehrad
patent: 5751012 (1998-05-01), Wolstenholme et al.
patent: 5821558 (1998-10-01), Han et al.
patent: 5835396 (1998-11-01), Zhang
patent: 5942777 (1999-08-01), Chang
patent: 5949710 (1999-09-01), Pass et al.
patent: 6002607 (1999-12-01), Dvir
patent: 6026017 (2000-02-01), Wong et al.
patent: 6033955 (2000-03-01), Kuo et al.
patent: 6034882 (2000-03-01), Johnson et al.
patent: 6111302 (2000-08-01), Zhang et al.
patent: 6122209 (2000-09-01), Pass et al.
patent: 6185121 (2001-02-01), O'Neill
patent: 6185122 (2001-02-01), Johnson et al.
patent: 6351406 (2002-02-01), Johnson et al.
patent: 2001/0011776 (2001-08-01), Igarashi et al.
patent: 2001/0055838 (2001-12-01), Walker et al.
Victor W.C. Chan et al., “Multiple Layers of CMOS Inegrated Circuits Using Recrystallized Silicon Film” IEEE Electron Device Letters, V. 22, No. 2 (Feb. 2001) pp. 77-79.
Thomas H. Lee, “A Vertical Leap for Microchips,” Scientific American, Jan. 2002, pp. 53-59.
Esmat Hamdy et al., “Dielectric based antifuses for logic and memory ICs” IEEE International Electron Devices Meeting, IEDM 88 (Aug. 1988) pp. 786-789.
Chenming Hu, “Interconnect devices for field programmable gate array.” IEEE International Electron Devices Meeting, IEDM 92 (Apr. 1992) pp. 591-594.
Jonathan Green et al., “Antifuse Field Programmable Gate Arrays” Proc. IEEE vol. 81 No. 7 (Jul. 1993), pp. 1042-1056.
Vivek D. Kulkarni et al. “Patterning of Submicron Metal Features and Pillars in Multilevel Metallization” J. Electrochem. Soc. vol. 135 No. 12 (Dec. 1988) pp. 3094-3098.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Interconnection structure and methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Interconnection structure and methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Interconnection structure and methods will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3183639

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.