Interconnecting substrate and semiconductor device

Electricity: conductors and insulators – Conduits – cables or conductors – Preformed panel circuit arrangement

Reexamination Certificate

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Details

C174S254000

Reexamination Certificate

active

07745736

ABSTRACT:
An interconnecting substrate is provided with a base insulating film having a sunken section in a bottom surface thereof, a first interconnection provided in the sunken section, a via hole formed in the base insulating film, and a second interconnection which is connected to the first interconnection via a conductor within the via hole and is formed on a top surface of the base insulating film, wherein the interconnecting substrate includes a first interconnection pattern formed of the first interconnection which includes at least a linear pattern which extends along a second direction orthogonal to a first direction, and a warpage-controlling pattern which is provided in the sunken section in the bottom surface of the base insulating film and is formed in such a manner as to suppress a warpage of the interconnecting substrate toward a bottom side on both sides of the first direction.

REFERENCES:
patent: 6429385 (2002-08-01), Tandy
patent: 6797367 (2004-09-01), Ogawa et al.
patent: 6815619 (2004-11-01), Iwasaki et al.
patent: 6835897 (2004-12-01), Chang et al.
patent: 6864434 (2005-03-01), Chang et al.
patent: 7321099 (2008-01-01), Mishiro
patent: 8-51258 (1996-02-01), None
patent: 11-163022 (1999-06-01), None
patent: 11-177191 (1999-07-01), None
patent: 2000-3980 (2000-01-01), None
patent: 2000-323613 (2000-11-01), None
patent: 2000-353863 (2000-12-01), None
patent: 2002-33555 (2002-01-01), None
patent: 2002-83893 (2002-03-01), None
patent: 2002-198462 (2002-07-01), None
patent: 2004-179647 (2004-06-01), None
patent: 2005-327780 (2005-11-01), None

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