Optics: measuring and testing – Lamp beam direction or pattern
Patent
1995-01-31
1997-07-01
Pham, Hoa Q.
Optics: measuring and testing
Lamp beam direction or pattern
355 67, 359619, G01J 100, G02B 2710
Patent
active
056443900
ABSTRACT:
In an intensity distribution simulation method for a demagnification projection aligner, the light intensity distribution due to each of unit lenses constituting an integrator is approximated with a Gaussian-distribution approximate equation to thereby model the integrator, and the light intensity distribution of a reticle pattern (mask pattern) on an image plane is calculated on the basis of the calculated light intensity distribution of the modeled integrator.
REFERENCES:
patent: 4428647 (1984-01-01), Sprague et al.
patent: 4798962 (1989-01-01), Matsumoto et al.
patent: 4799791 (1989-01-01), Echizen et al.
patent: 5067811 (1991-11-01), Ouchi
patent: 5091744 (1992-02-01), Omata
patent: 5333077 (1994-07-01), Legar et al.
M. Yeung, Modeling Aerial Images in Two and Three Dimensions, Proceedings of the Kodak Microelectronics seminar Interface '85, 1986, pp. 115-126.
M. Born et al., Principles of Optics Electromagnetic Theory of Propagation, Interference and Diffraction of Light, pp. 491-555.
NEC Corporation
Pham Hoa Q.
LandOfFree
Intensity distribution simulating method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Intensity distribution simulating method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Intensity distribution simulating method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-601702