Intense X-ray source using a plasma microchannel

Details Intense X-ray source using a plasma microchannel Intense X-ray source using a plasma microchannel

1984-08-23

1986-12-02

Anderson, Bruce C.

X-ray or gamma ray systems or devices

Source

Electron tube

376144, 378119, H01J 3500, H01J 3522

Patent

active

046270884

ABSTRACT:
Intense soft X-ray source having an enclosure filled with gas and having two electrodes connected to a high voltage source, one of the electrodes having an opening. A device is provided for producing a photoionizing radiation directed through the opening. The radiation traversing the gas in the direction of the other electrode and during its passage producing a plasma microchannel, an electrical discharge supplied by the source then occurring in the microchannel, wherein the device for producing the photoionizing radiation is an auxiliary soft X-ray source.

REFERENCES:
patent: 3746860 (1973-07-01), Shatas et al.
patent: 3946236 (1976-03-01), Roberts et al.
patent: 4058486 (1977-11-01), Mallozzi et al.
patent: 4152625 (1979-05-01), Conrad
patent: 4179599 (1979-12-01), Conrad
patent: 4504964 (1985-03-01), Cartz et al.
patent: 4538291 (1985-08-01), Iwamatsu
Dinev, et al; X-Ray Emission from a Laser Irradiated Target in the _Presence of High Electric Field, Optics Communications, Aug. 1979, vol. 30, #2.
Zory, Coherent X-Ray Generator, IBM Tech. Disclos. Bulletin, Jan. 1976, vol. 18, #8.
J. Bruneteau et E. Fabre, Photoionisation D'Un Gaz Par Le Rayonement Ultra Violet Extreme D'Un Plasma Cree Par Laser, Physics Letters, Jun. 5, 1972, vol. 39A, #5.

Affiliated with

Also associated with

Rating

Intense X-ray source using a plasma microchannel does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Intense X-ray source using a plasma microchannel, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Intense X-ray source using a plasma microchannel will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2298153