Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1988-09-27
1990-07-17
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31511101, 31511131, 31323101, 250423R, 2504923, H01J 2900
Patent
active
049423398
ABSTRACT:
An intense, steady state, low emittance electron beam generator is formed by operating a hollow cathode discharge plasma source at critical levels in combination with an extraction electrode and a target electrode that are operable to extract a beam of fast primary electrons from the plasma source through a negatively biased grid that is critically operated to repel bulk electrons toward the plasma source while allowing the fast primary electrons to move toward the target in the desired beam that can be successfully transported for relatively large distances, such as one or more meters away from the plasma source.
REFERENCES:
patent: 2975277 (1961-03-01), Von Ardenne
patent: 3373304 (1968-03-01), Lustig
patent: 3409525 (1968-11-01), Chopra et al.
patent: 3411035 (1968-11-01), Hecker et al.
patent: 3955091 (1976-05-01), Robinson et al.
patent: 4687938 (1987-08-01), Tamura et al.
patent: 4749912 (1988-06-01), Hara et al.
Hershcovitch Ady
Kovarik Vincent J.
Prelec Krsto
Constant Richard E.
LaRoche Eugene R.
Moser William R.
Myles Vale
The United States of America as represented by the United States
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