Integrator for an exposure apparatus or the like

Details Integrator for an exposure apparatus or the like Integrator for an exposure apparatus or the like

1987-06-12

1989-06-20

Hix, L. T.

Photocopying

Projection printing and copying cameras

Identifying, composing, or selecting

355 53, 355 67, 350167, G03B 2770, G03B 2772

Patent

active

048413410

ABSTRACT:
An exposure apparatus for manufacturing semiconductor devices and in particular an excimer laser exposure apparatus includes, an integrator for uniformly distributing the excimer laser beam used as an exposure light source to render the exposure illuminance uniform at an exposure area. The integrator is characterized by a plurality of concentric-circular or parallel stripe-like recesses on one of two main opposing surfaces so that the light entering one main surface is dispersively radiated fromthe other main surface to render the excimer laser light from the light source uniform so as to reduce uneven exposure illuminance in the exposure area.

REFERENCES:
patent: 3536378 (1970-10-01), Bishop
patent: 3740119 (1973-06-01), Sukurai et al.
patent: 3832032 (1974-08-01), Shimada
patent: 3941475 (1976-03-01), Sheets
patent: 3988066 (1976-10-01), Suzuki et al.
patent: 4653903 (1987-03-01), Torigoe et al.

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